RESEARCH

Advanced thin film deposition technique for semiconductor devices

Self-saturation mechanism
Atomic level thickness control
Large are uniformity

Good conformality
Excellent repeatability
Flat and smooth surface

DRAM

High-k dielectrics
High work function electrodes
Muticomponent thin films

Memristor

Nonvolatile memories
Neuromorphic devices for AI applications

Display

Flexible devices
Transparent displays
High mobility oxide films

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