RESEARCH

Advanced thin film deposition technique for semiconductor devices

  • Self-saturation mechanism

  • Atomic level thickness control

  • Large are uniformity

  • Good conformality

  • Excellent repeatability

  • Flat and smooth surface

DRAM

  • High-k dielectrics

  • High work function electrodes

  • Muticomponent thin films

Memristor

  • Nonvolatile memories

  • Neuromorphic devices for AI applications

Display

  • Flexible devices

  • Transparent displays

  • High mobility oxide films